Through silicon via structure, method of formation, and integration in semiconductor substrate | Patent Publication Number 20130087893

US 20130087893 A1
Patent NumberUS 09147609 B2
Application Number13415744
Filled DateMar 8, 2012
Priority DateOct 7, 2011
Publication DateApr 11, 2013
Original AssigneeNewport Fab Llc
Inventor/ApplicantsDavid J. Howard
Hadi Jebory
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