Electrode for plasma processing apparatus and plasma processing apparatus | Patent Number 12165850

US 12165850 B2
Application Number17720359
Publication NumberUS 20220344127 A1
Pendency2 years, 8 months, 1 day
Filled DateApr 14, 2022
Priority DateApr 14, 2022
Publication DateOct 27, 2022
Expiration DateApr 13, 2042
Inventor/ApplicantsTakaki KOBUNE
Takaki Kobune
Examines-
Art Unit0
Technology Center0
Assignments
Tokyo Electron Limited
Current
Tokyo Electron Limited
Original
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