Photoresist composition and method of forming photoresist pattern | Patent Application Number 16163425

16163425
Not Appealed
Patent NumberUS 11016386 B2
Publication NumberUS 20190384170 A1
Filled DateOct 17, 2018
Priority DateJun 15, 2018
Inventor/ApplicantsChin-Hsiang Lin
Ching-Yu Chang
An-Ren Zi
An-Ren ZI
Ching-Yu CHANG
Chin-Hsiang LIN
ExaminesDUDA, KATHLEEN
Art Unit1737
Technology Center1700
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
Law Firm
You must be logged in to view
Login
Attorneys
Subscription-Only
View Concierge Program
Patent Prosecution report image

Empower your practice with Patexia Publication Prosecution IP Module.

Get access to our exclusive rankings and unlock powerful data.
Check our Latest ReportPurchase IP Module

Looking for a Publication Attorney?

Get in touch with our team or create your account to start exploring a network of over 120K attorneys.