Organometallic solution based high resolution patterning compositions and corresponding methods | Patent Application Number 14920107

14920107
Appealed
Patent NumberUS 10642153 B2
Publication NumberUS 20160116839 A1
Filled DateOct 22, 2015
Priority DateOct 23, 2014
Inventor/ApplicantsStephen T. Meyers
Douglas A. Keszler
Alan J. Telecky
Michael K. Kocsis
Jeremy T. Anderson
Joseph Burton Edson
Kai Jiang
Brian J. Cardineau
ExaminesCHACKO DAVIS, DABORAH
Art Unit1737
Technology Center1700
Assignments
Inpria Corporation
Current
Inpria Corporation
Original
Law Firm
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