DUAL CRITICAL DIMENSION PATTERNING | Patent Publication Number 20220328304

US 20220328304 A1
Patent Number-
Application Number17370382
Filled DateJul 8, 2021
Priority DateApr 9, 2021
Publication DateOct 13, 2022
Original Assignee
Current AssigneeTaiwan Semiconductor Manufacturing Company
Inventor/ApplicantsKuo-Chang Kau
Chia-Chu Liu
Hua-Tai Lin
Wen-Yun Wang
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