DUAL CRITICAL DIMENSION PATTERNING | Patent Application Number 17370382

17370382
Not Appealed
Patent Number-
Publication NumberUS 20220328304 A1
Filled DateJul 8, 2021
Priority DateApr 9, 2021
Inventor/ApplicantsKuo-Chang Kau
Chia-Chu Liu
Hua-Tai Lin
Wen-Yun Wang
ExaminesTRAPANESE, WILLIAM C
Art Unit2826
Technology Center2800
Assignments
Taiwan Semiconductor Manufacturing Company
Current
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