Colloidal silica chemical-mechanical polishing composition | Patent Number 09499721

US 09499721 B2
Application Number14749948
Publication NumberUS 20150376459 A1
Pendency1 year, 5 months, 1 day
Filled DateJun 25, 2015
Priority DateJun 25, 2014
Publication DateDec 31, 2015
Expiration DateJun 24, 2034
Inventor/ApplicantsSteven Grumbine
Mary Cavanaugh
Jeffrey Dysard
Ernest Shen
ExaminesANGADI, MAKI A
Art Unit1713
Technology Center1700
Assignments
Cmc Materials
Current
Cabot Microelectronics CorporationEntegris
Original
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