Biased pulse DC reactive sputtering of oxide films | Patent Number 07544276

US 07544276 B2
Application Number11228834
Publication NumberUS 20060054496 A1
Pendency3 years, 8 months, 27 days
Filled DateSep 16, 2005
Priority DateMar 16, 2002
Publication DateMar 16, 2006
Expiration DateMar 16, 2022
Inventor/ApplicantsHongmei Zhang
Richard E. Demaray
Mukundan Narasimhan
Ravi B. Mullapudi
ExaminesMCDONALD, RODNEY GLENN
Art Unit1795
Technology Center1700
Assignments
Demaray Llc
Current
Symmorphix Inc.
Original
Springworks Llc
Original
Law Firm
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