Biased pulse DC reactive sputtering of oxide films | Patent Application Number 11228834

11228834
Not Appealed
Patent NumberUS 07544276 B2
Publication NumberUS 20060054496 A1
Filled DateSep 16, 2005
Priority DateMar 16, 2002
Inventor/ApplicantsMukundan Narasimhan
Ravi B. Mullapudi
Richard E. Demaray
Hongmei Zhang
ExaminesMCDONALD, RODNEY GLENN
Art Unit1795
Technology Center1700
Assignments
Demaray Llc
Current
Symmorphix Inc.
Original
Springworks Llc
Original
Law Firm
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