Elimination of residual materials in a multiple-layer interconnect structure | Patent Application Number 8925821
8925821
Appealed
Inventor/Applicants Diana M. Schonauer
Christy Mei-Chu Woo de la Girond'arc
Subramanian Venkatkrishnan
Steven C. Avanzino
Darin A. Chan
Minh Van Ngo
Christy Mei-Chu Woo de la Girond'arc
Subramanian Venkatkrishnan
Steven C. Avanzino
Darin A. Chan
Minh Van Ngo
ExaminesPOTTER, ROY KARL
Art Unit2822
Technology Center2800
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