PLASMA PROCESSING APPARATUS | Patent Publication Number 20210249233

US 20210249233 A1
Patent Number-
Application Number16980501
Filled DateDec 18, 2019
Priority DateDec 18, 2019
Publication DateAug 12, 2021
Original Assignee
Current AssigneeHitachi Hightech Instruments Co. Ltd
Inventor/ApplicantsMasahito Mori
Takao Arase
Hiroyuki Kajifusa
Kenetsu Yokogawa
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