High deposition rate sputtering | Patent Number 07811421
US 07811421 B2Filled DateJul 18, 2005
Priority DateMar 28, 2005
Publication DateNov 17, 2005
Expiration DateOct 12, 2018
Inventor/ApplicantsRoman Chistyakov
ExaminesMCDONALD, RODNEY GLENN
Art Unit1795
Technology Center1700
Assignments
Law Firm
You must be logged in to view
LoginAttorneys
Subscription-Only
View Concierge ProgramSee the invalidated claims, subscribe to our Concierge Program.
View Concierge ProgramEmpower your practice with Patexia Publication Prosecution IP Module.
Get access to our exclusive rankings and unlock powerful data.
Looking for a Publication Attorney?
Get in touch with our team or create your account to start exploring a
network of over 120K attorneys.