Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Patent Number 06969539

US 06969539 B2
Application Number10381628
Publication NumberUS 20040043149 A1
Pendency4 years, 2 months, 3 days
Filled DateSep 28, 2001
Priority DateSep 28, 2000
Publication DateMar 4, 2004
Expiration DateSep 28, 2020
Inventor/ApplicantsJill Becker
Dennis Hausmann
Dennis Hausmann
Jill Becker
Seigi Suh
Roy G. Gordon
Roy G. Gordon
Seigi Suh
ExaminesCHEN, BRET P
Art Unit1762
Technology Center1700
Assignments
Harvard College
Current
Harvard College
Original
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