Gate oxide structures in semiconductor devices | Patent Application Number 17875751

17875751
Not Appealed
Patent NumberUS 11961766 B2
Publication NumberUS 20230015886 A1
Filled DateJul 28, 2022
Priority DateSep 25, 2020
Inventor/ApplicantsChung-Liang Cheng
Chung-Liang CHENG
ExaminesLEE, CHEUNG
Art Unit2826
Technology Center2800
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
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