LASER ANNEALING SYSTEM AND METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | Patent Application Number 16914594

16914594
Not Appealed
Patent Number-
Publication NumberUS 20210138581 A1
Filled DateJun 29, 2020
Priority DateJun 29, 2020
Inventor/ApplicantsSEONGKEUN CHO
HYUKJUN KWON
ExaminesFERDOUSI, FAHMIDA NMN
Art Unit3761
Technology Center3700
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