Biased pulse DC reactive sputtering of oxide films | Patent Number 07381657

US 07381657 B2
Application Number10954182
Publication NumberUS 20050048802 A1
Pendency3 years, 8 months, 6 days
Filled DateOct 1, 2004
Priority DateMar 16, 2002
Publication DateMar 3, 2005
Expiration DateMar 16, 2022
Inventor/ApplicantsRavi Mullapudi
Richard E. Demaray
Hongmei Zhang
Mukundan Narasimhan
Ravi B. Mullapudi
ExaminesMANDALA, MICHELLE
Art Unit2823
Technology Center2800
Assignments
Demaray Llc
Current
Springworks Llc
Original
Symmorphix Inc.
Original
Law Firm
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