The body 110 may include a capacitance formation portion Ac disposed in the body 110, and including a first internal electrode 121 and a second internal electrode 122 disposed to oppose each other with the dielectric layer 111 interposed therebetween and having capacitance formed therein, and cover portions 112 and 113 formed above and below the capacitance formation portion Ac in the first direction.

In addition, the capacitance formation portion Ac is a portion serving to contribute to capacitance formation of a capacitor, and may be formed by repeatedly laminating a plurality of first and second internal electrodes 121 and 122 with a dielectric layer 111 interposed therebetween.

The cover portions 112 and 113 may include an upper cover portion 112 disposed above the capacitance formation portion Ac in the first direction, and a lower cover portion 113 disposed below the capacitance formation portion Ac in the first direction.

The upper cover portion 112 and the lower cover portion 113 may be formed by laminating a single dielectric layer or two or more dielectric layers on the upper and lower surfaces of the capacitance formation portion Ac in a thickness direction, respectively, and the upper cover portion 112 and the lower cover portion 113 may serve to basically prevent damage to the internal electrodes due to physical or chemical stress.

The upper cover portion 112 and the lower cover portion 113 may not include internal electrodes, and may include the same material as that of the dielectric layer 111.

That is, the upper cover portion 112 and the lower cover portion 113 may include a ceramic material, for example, a barium titanate (BaTiO₃)-based ceramic material.

Meanwhile, a thickness of the cover portions 112 and 113 need not be particularly limited. However, a thickness “tc” of the cover portions 112 and 113 may be 15 μm or less in order to more easily achieve miniaturization and high capacitance of the multilayer electronic component.

The average thickness “tc” of the cover portions 112 and 113 may mean a size thereof in the first direction, and may be a value obtained by averaging sizes of the cover portions 112 and 113 measured in the first direction at five points having equal intervals above or below the capacitance formation portion Ac.

In addition, margin portions 114 and 115 may be disposed on a side surface of the capacitance formation portion Ac.

The margin portions 114 and 115 may include a first margin portion 114 disposed on the fifth surface 5 of the body 110 and a second margin portion 115 disposed on the sixth surface 6 thereof. That is, the margin portions 114 and 115 may be disposed on both end surfaces of the body in a width direction.

The margin portions 114 and 115 may mean a region between both ends of the first and second internal electrodes 121 and 122 and an interface of the body 110 in a cross-section of the body 110 taken in a width-thickness (W-T) direction, as illustrated in FIG. 3.

The margin portions 114 and 115 may basically serve to prevent damages to the internal electrodes due to physical or chemical stresses.

The margin portions 114 and 115 may be formed by applying a conductive paste to the ceramic green sheet, except where margin portions are to be formed, to form an internal electrode.

In addition, in order to suppress a step by the internal electrodes 121 and 122, after the internal electrodes are cut so as to be exposed to the fifth and sixth surfaces 5 and 6 of the body after lamination, the margin portions 114 and 115 may also be formed by laminating a single dielectric layer or two or more dielectric layers on both side surfaces of the capacitance formation portion Ac in the third direction (width direction).

Meanwhile, a width of the margin portions 114 and 115 is not particularly limited. However, in order to more easily implement miniaturization and high capacitance of the multilayer electronic component, an average width of the margin portions 114 and 115 may be 15 μm or less.

The average width of the margin portions 114 and 115 may mean an average size of the margin portions 114 and 115 in a third direction, and may be a value obtained by averaging sizes of the margin portions 114 and 115 measured at five points having equal intervals in the third direction in terms of the capacitance formation portion Ac.

Accordingly, in an embodiment, an average size of a region in which the internal electrodes 121 and 122 are spaced apart from the fifth and sixth surfaces in the third direction may be 15 μm or less, respectively.

The internal electrodes 121 and 122 may include first and second internal electrodes 121 and 122. The first and second internal electrodes 121 and 122 may be alternately disposed to oppose each other with the dielectric layer constituting the body 110 interposed therebetween, and may be exposed to the third and fourth surfaces 3 and 4 of the body 110, respectively.

The first internal electrode 121 may be spaced apart from the fourth surface 4 and exposed through the third surface 3, and the second internal electrode 122 may be spaced apart from the third surface 3 and exposed through the fourth surface 4. A first external electrode 131 may be disposed on the third surface 3 of the body to be connected to the first internal electrode 121, and a second external electrode 132 may be disposed on the fourth surface 4 of the body to be connected to the second internal electrode 122.

That is, the first internal electrode 121 is not connected to the second external electrode 132, but is connected to the first external electrode 131, and the second internal electrode 122 is not connected to the first external electrode 131, but is connected to the second external electrode 132. Accordingly, the first internal electrode 121 may be formed to be spaced apart from the fourth surface 4 by a predetermined distance, and the second internal electrode 122 may be formed to be spaced apart from the third surface 3 by a predetermined distance. In addition, the first and second internal electrodes 121 and 122 may be spaced apart from the fifth and sixth surfaces 5 and 6 of the body 110.

In this case, the first and second internal electrodes 121 and 122 may be electrically isolated from each other by the dielectric layer 111 disposed in a middle.

The body 110 may be formed by alternately laminating a ceramic green sheet on which the first internal electrode 121 is printed and a ceramic green sheet on which the second internal electrode 122 is printed, followed by sintering.

A material for forming the internal electrodes 121 and 122 are not particularly limited, and as the material, a material having excellent electrical conductivity may be used. For example, the internal electrodes 121 and 122 may include one or more of nickel (Ni), copper (Cu), palladium (Pd), silver (Ag), gold (Au), platinum (Pt), tin (Sn), tungsten (W), titanium (Ti), and alloys thereof.

In addition, the internal electrodes 121 and 122 may be formed by printing a conductive paste for the internal electrodes including at least one of nickel (Ni), copper (Cu), palladium (Pd), silver (Ag), gold (Au), platinum (Pt), tin (Sn), tungsten (W), titanium (Ti) and an alloy thereof on a ceramic green sheet. A method for printing the conductive paste for the internal electrodes may be a screen printing method or a gravure printing method, but the present disclosure is not limited thereto.

Meanwhile, a thickness of the internal electrodes 121 and 122 does not need to be particularly limited.

However, in general, when the internal electrode is formed thin to have a thickness of 0.6 μm or less, in particular, when the thickness of the internal electrode is 0.35 μm or less, it may be vulnerable to deterioration in reliability by moisture, a plating solution, and the like, permeating into the body.

However, even when an average thickness of the base electrode layers 131a and 132a is 3 μm or less, by disposing thin film electrode layers 131b and 132b of 300 nm or more on the base electrode layers 131a and 132a, it is possible to prevent moisture, a plating solution, and the like, from permeating into the body, so that even when an average thickness “te” of at least one of the plurality of internal electrodes 121 and 122 is 0.35 μm or less, excellent reliability may be secured.

Accordingly, when the average thickness “te” of at least one of the plurality of internal electrodes 121 and 122 is 0.35 μm or less, an effect according to the present disclosure may be more remarkable, and miniaturization and high capacitance of the multilayer electronic component may be more easily achieved.

The average thickness “te” of the internal electrodes 121 and 122 may mean an average size of the internal electrodes 121 and 122 in the first direction.

The average thickness of the internal electrodes 121 and 122 may be measured by scanning an image of a cross-section of the body 110 in the length and thickness directions (L-T directions) with a scanning electron microscope (SEM) with a magnification of 10,000. More specifically, an average value may be measured by measuring a thickness of one dielectric layer at 30 equally spaced points in the length direction from the scanned image. The 30 points having equal intervals may be designated in the capacitance formation portion Ac. In addition, if the average value is measured by extending the average value measurement to 10 internal electrodes, the average thickness of the internal electrodes can be more generalized.

External electrodes 131 and 132 may be disposed on the third surface 3 and the fourth surface 4 of the body 110.

The external electrodes 131 and 132 may include first and second external electrodes 131 and 132 respectively disposed on the third and fourth surfaces 3 and 4 of the body 110, to be respectively connected to the first and second internal electrodes 121 and 122.

Meanwhile, in the present embodiment, a structure in which the multilayer electronic component 100 has two external electrodes 131 and 132 is described. However, the number and shape of the external electrodes 131 and 132 may be changed according to the shape of the internal electrodes 121 and 122 or any other purposes.

The external electrodes 131 and 132 may include base electrode layers 131a and 132a connected to the internal electrodes 131 and 132, thin film electrode layers 131b and 132b disposed on the base electrode layers 131a and 132a, and plating layers 131c and 132c disposed on the thin film electrode layers 131b and 132b. The first external electrode 131 may include a first base electrode layer 131a disposed on the third surface 3 and connected to the first internal electrode 121, a first thin film electrode layer 131b disposed on the first base electrode layer, and a first plating layer 131c disposed on the first thin film electrode layer 131b, and the second external electrode 132 may include a second base electrode layer 132a disposed on the fourth surface 4 and connected to the second internal electrode 122, a second thin film electrode layer 132b disposed on the second base electrode layer, and a second plating layer 132c disposed on the second thin film electrode layer 132b.

The base electrode layers 131a and 132a may serve to electrically connect the internal electrodes 121 and 122 and the external electrodes 131 and 132. In addition, the thin film electrode layers 131b and 132b may serve to prevent moisture, a plating solution, and the like from permeating into the body 110.

When the base electrode layers 131a and 132a are formed to be thick, permeation of moisture, plating solution, and the like into the body may be prevented to some extent without forming separate thin film electrode layers 131b and 132b. However, as in the present disclosure, when the base electrode layers 131a and 132a are formed to be thin, fine voids of the base electrode layers 131a and 132a may be formed so that moisture, a plating solution, and the like may permeate into the body 110. Accordingly, according to an embodiment of the present disclosure, by forming the thin film electrode layers 131b and 132b on the base electrode layers 131a and 132a, it is possible to prevent moisture, a plating solution, and the like from permeating into the body.

An average thickness of the first base electrode layer 131a and an average thickness of the second base electrode layer 132a may be 1 μm or more and 3 μm or less, and an average thickness of the first thin film electrode layer 131b and an average thickness of the second thin film electrode layer 132b may be 300 nm or more and 800 nm or less.

When the average thickness of the first base electrode layer 131a and the average thickness of the second base electrode layer 132a are less than 1 μm, connectivity between the external electrodes 131 and 132 and the internal electrodes 121 and 122 may be deteriorated, and when the average thickness of the first base electrode layer 131a and the average thickness of the second base electrode layer 132a exceed 3 μm, it may be difficult to maximize an effect of improving capacitance per unit volume.

When the average thickness of the first thin film electrode layer 131b and the average thickness of the second thin film electrode layer 132b are less than 300 nm, fine voids of the base electrode layers 131a and 132a may not be covered so that there may be a concern that a reliability improvement effect by the thin film electrode layers 131b and 132b is insufficient, and when the average thickness of the first thin film electrode layer 131b and the average thickness of the second thin film electrode layer 132b exceed 800 nm, bonding force between the base electrode layers 131a and 132a and the thin film electrode layers 131b and 132b may be weakened, so that a peeling phenomenon between the base electrode layers 131a and 132a and the thin film electrode layers 131b and 132b may occur. When a peeling phenomenon occurs between the base electrode layers 131a and 132a and the thin film electrode layers 131b and 132b, moisture resistance reliability may deteriorate.

An average thickness of the first base electrode layer 131a, an average thickness of the second base electrode layer 132a, an average thickness of the first thin film electrode layer 131b, and an average thickness of the second thin film electrode layer 132b may be measured from an image scanned using a scanning electron microscope (SEM), after being polished to a center of the multilayer electronic component in a third direction, to expose a cross-section thereof in first and second directions.

Specifically, the average thickness of the first base electrode layer 131a may be measured in a central portion of the body in the first direction in the exposed image, and may be a value averaging a size of the first base electrode layer 131a in the second direction, measured at 10 points equally spaced in the first direction. The average thickness of the second base electrode layer 132a, the average thickness of the first thin film electrode layer 131b, and the average thickness of the second thin film electrode layer 132b may be measured in the same manner.

Hereinafter, description will be made based on the first external electrode 131, but since the second external electrode 132 has a symmetrical relationship with the first external electrode 131 in the second direction, the description may be equally applied to the second external electrode 132.

The base electrode layers 131a and 132a may include a conductive metal. The conductive metal included in the base electrode layers 131a and 132a may be formed using any material as long as it has electrical conductivity, and a specific material may be determined in consideration of electrical characteristics, structural stability, and the like. For example, the conductive metal included in the base electrode layers 131a and 132a may be at least one of nickel (Ni), copper (Cu), palladium (Pd), silver (Ag), gold (Au), platinum (Pt), and alloys thereof. As a more preferable example, the conductive metal included in the base electrode layers 131a and 132a may be nickel (Ni), but an embodiment thereof is not limited thereto.

In an embodiment, the base electrode layers 131a and 132a may include a conductive metal and glass. The conductive metal included in the base electrode layers 131a and 132a serves to secure electrical connectivity, and as the base electrode layers 131a and 132a include glass, bonding force with the body 110 may be improved.

Meanwhile, a method of forming the base electrode layers 131a and 132a does not need to be particularly limited, but it is difficult to form the thickness of the base electrode layer 132a thin when using a dipping method, which is a conventional general external electrode formation method. As a preferred example, the base electrode layers 131a and 132a may be formed using a pad printing method. The pad printing method may refer to a method of forming a base electrode layer on one surface of the body by manufacturing a pad with an external electrode paste on a support and then compressing the body to the pad. In this case, the pad formed of the external electrode paste may include conductive metal and glass, and may include components such as a binder, an organic solvent, and the like.

In an embodiment, a size of the first base electrode layer 131a in the second direction, measured in the center of the body in the first direction is t1, and a size of the first base electrode layer 131a in the second direction measured in the first internal electrode disposed in an outermost portion in the first direction is t1′, t1′/t1 may be 0.8 or more and 1.0 or less. As the base electrode layers 131a and 132a are formed by the pad printing method, the base electrode layers 131a and 132a may have a uniform thickness, and t1′/t1 may be easily controlled to be 0.8 or more and 1.0 or less.

In an embodiment, the first and second thin film electrode layers 131b and 132b may have an area ratio of 90% or more occupied by metal in cross-sections thereof in the first and second directions. Accordingly, it is easy to form the thickness of the thin film electrode layers 131b and 132b, so that moisture resistance reliability of the multilayer electronic component 100 may be improved, and capacitance per unit volume may be improved, and fine voids of the base electrode layers 131a and 132a may be more easily covered by the thin film electrode layers 131b and 132b. More preferably, the first and second thin film electrode layers 131b and 132b may have an area ratio of 95% or more, occupied by metal in cross-sections thereof in first and second directions. That is, the first and second thin film electrode layers 131b and 132b may be substantially formed of metal.

A method of forming the first and second thin film electrode layers 131b and 132b is not particularly limited, but in order to form the thin film electrode layers 131b and 132b thinly and densely, the thin film electrode layers 131b and 132b may be formed by a sputtering method, an atomic layer deposition method, or the like.

In an embodiment, the first and second thin film electrode layers 131b and 132b may be sputtering layers. As the first and second thin film electrode layers 131b and 132b are sputtering layers formed using a sputtering method, it is easy to form the thin film electrode layers 131b and 132b thin, so that moisture resistance reliability of the multilayer electronic component may be improved and capacitance per unit volume may be improved, and the fine voids of the base electrode layers 131a and 132a may be more easily covered by the thin electrode layer. Specifically, the metal constituting the thin film electrode layers 131b and 132b may be discharged in an atomic or ionic state and deposited on the body 110 to form the thin film electrode layers 131b and 132b.

A material of forming the thin film electrode layers 131b and 132b may be formed using any material as long as it has electrical conductivity, and a specific material may be determined in consideration of the material and electrical characteristics of the base electrode layers 131a and 132a. For example, the thin film electrode layers 131b and 132b may be at least one of nickel (Ni), copper (Cu), chromium (Cr), silver (Ag), gold (Au), platinum (Pt), palladium (Pd), and alloys thereof. As a more preferable example, the thin film electrode layers 131b and 132b may be one of copper (Cu), chromium (Cr), and Ni—Cr, but an embodiment thereof is not limited thereto.

In an embodiment, when a size of the first thin film electrode layer 131b in the second direction, measured in a center of the body 110 in the first direction is t2, and a size of the first thin film electrode layer 131b in the second direction, measured in a first internal electrode disposed in an outermost portion thereof in the first direction is t2′, t2′/t2 may be 0.9 or more and 1.1 or less. As the thin film electrode layers 131b and 132b are formed by a sputtering method, the thin film electrode layers 131b and 132b may have a uniform thickness, and t2′/t2 can be easily controlled to be 0.9 or more and 1.1 or less.

In an embodiment, in a cross-section of the first base electrode layer 131a in the first and second directions, the first base electrode layer 131a may include at least one void, and the first thin film electrode layer 131b may be disposed to cover the void. Accordingly, it is possible to prevent moisture, a plating solution, and the like from permeating into the void of the first base electrode layer 131a. When the average thickness of the first thin film electrode layer 131b is too thin, the void may not be covered, and a portion of the first thin film electrode layer 131b may be disposed in a cut-off form.

Meanwhile, the first plating layer 131c may be disposed to be spaced apart from the first base electrode layer 131a by the first thin electrode layer 131b in the void.

The plating layers 131c and 132c are disposed on the thin film electrode layers 131b and 132b. The first external electrode 131 may include a first plating layer 131c disposed on the first thin film electrode layer 131b, and the second external electrode 132 may include a second plating layer 132c disposed on the second thin film electrode layer 132b.

The plating layers 131c and 132c serves to improve mounting characteristics. A type of the plating layers 131c and 132c is not particularly limited, and may be a playing layer including Ni, Sn, Pd, and alloys thereof.

In addition, additional plating layers 131d and 132d may be disposed on the plating layers 131c and 132c. The first external electrode 131 may include a first additional plating layer 131d disposed on the first plating layer 131c, and the second external electrode 132 may include a second additional plating layer 132d disposed on the second plating layer 132c. As a preferable example, the plating layers 131c and 132c may be Ni plating layers, and the additional plating layers 131d and 132d may be Sn plating layers or Pd plating layers, but an embodiment thereof is not limited thereto.

In an embodiment, an average thickness of the first plating layer 131c and an average thickness of the second plating layers 132c may be 2 μm or more and 7 μm or less. Accordingly, the mounting characteristics of the multilayer electronic component can be easily improved. More preferably, the average thickness of the first plating layer 131c and the average thickness of the second plating layer 132c may be 3 μm or more and 5 μm or less.

In addition, an average thickness of the first additional plating layer 131d and an average thickness of the second additional plating layer 132d may be 2 μm or more and 7 μm or less. More preferably, the average thickness of the first additional plating layer 131d and the average thickness of the second additional plating layer 132d may be 3 μm or more and 5 μm or less.

Meanwhile, in general, an electrode layer of the external electrode may have a structure, thicker than a plating layer, but according to an embodiment of the present disclosure, a sum of an average thickness of the base electrode layers 131a and 132a and an average thickness of the thin film electrode layers 131b and 132b may be smaller than a sum of an average thickness of the plating layers 131c and 132c and an average thickness of additional plating layers 131d and 132d. Accordingly, capacitance per unit volume of the multilayer electronic component can be further improved.

Therefore, the sum of the average thickness of the first base electrode layer 131a and the average thickness of the first thin film electrode layer 131b may be smaller than the sum of the average thickness of the first plating layer 131c and the average thickness of the first additional plating layers 131d and 132d.

Furthermore, the sum of the average thickness of the first base electrode layer 131a and the average thickness of the first thin film electrode layer 131b may be smaller than the average thickness of the first plating layer 131c. Referring to FIG. 6, a thickness “t1” of the first base electrode layer measured in a central portion of the body in a first direction may be smaller than a thickness “t3” of the first plating layer, and may be smaller than a thickness “t4” of the first additional plating layer.

In an embodiment, the base electrode layers 131a and 132a may be disposed below an extension line E2 of a second surface 2, and may include a band portion disposed to extend onto the first surface 1. The first base electrode layer 131a may be disposed below the second extension line E2 of the second surface 2 and may include a first band portion disposed to extend onto the first surface 1, and the second base electrode layer 132a may be disposed below the extension line E2 of the second surface 2, and may include a second band portion disposed to extend onto the first surface 1.

In this case, one end of the first base electrode layer 131a may be disposed on a 2-3 corner (c2-3) connecting the second and third surfaces, and the other end of the first base electrode layer may be disposed on the first surface 1. One end of the second base electrode layer 132a may be disposed on a 2-4 corner (c2-4) connecting the second and fourth surfaces, and the other end of the second base electrode layer 132a may be disposed on the first surface 1.

As the base electrode layers 131a and 132a are disposed below an extension line E2 of the second surface 2, capacitance per unit volume of the multilayer electronic component 100 may be improved, and as the base electrode layers 131a and 132a include a band portion disposed to extend onto the first surface 1, it may be easily mounted on a substrate. Meanwhile, the band portion of the base electrode layer may be formed by a printing conductive paste, separately on the first surface 1 of the body.

In an embodiment, the thin film electrode layers 131b and 132b may be disposed between an extension line E2 of the second surface 2 and an extension line E1 of the first surface 1. Since permeation of moisture, a plating solution, and the like, may easily occur in a cross-section thereof from which an internal electrode is exposed, the thin film electrode layers 131b and 132b may be disposed between the extension line E2 of the second surface 2 and the extension line E1 of the first surface 1 and the thin film electrode layers 131b and 132b may be minimally disposed, so that the moisture resistance reliability of the multilayer electronic component 100 may be improved.

However, an embodiment thereof is not limited thereto, and referring to FIG. 7, schematically illustrating a cross-section of a multilayer electronic component 100′ in first and second cross-sections according to a modified example of the present disclosure, base electrode layers 131a′ and 132a′ may be disposed below the extension line E2 of the second surface 2, and may include a band portion disposed to extend onto the first surface 1, and thin film electrode layers 131b′ and 132b′ may be disposed below the extension line E2 of the second surface 2, and disposed to cover the band portion. The first thin film electrode layer 131b′ may be disposed below the extension line E2 on the second surface 2, and may be disposed to cover the first band portion of the first base electrode layer 131a′, and the second thin film electrode layer 132b′ may be disposed below the extension line E2 of the second surface 2, and may be disposed to cover the second band portion of the second base electrode layer 132a′. Thereby, moisture resistance reliability can be further improved. In addition, plating layers 131c′ and 132c′ may be disposed to cover the base electrode layers 131a′ and 132a′ and the thin film electrode layers 131b′ and 132b′, and the external electrodes 131′ and 132′ may be additional plating layers 131d′ and 132d′ disposed on the plating layers 131c′ and 132c′.

Meanwhile, referring to FIG. 8 schematically illustrating a cross-section of a multilayer electronic component 100″ in first and second directions according to another modified example of the present disclosure, as base electrode layers 131a″ and 132a″ are disposed between the extension line E2 of the second surface 2 and the extension line E1 of the first surface 1, capacitance per unit volume of the multilayer electronic component 100″ may be further improved. Accordingly, in an embodiment, the first and second base electrode layers 131a″ and 132a″ may be disposed between the extension line E2 of the second surface 2 and the extension line E1 of the first surface 1.

In this case, the first and second thin film electrode layers 131b″ and 132b″ may also be disposed between the extension line E2 of the second surface 2 and the extension line E1 of the first surface 1. However, as the plating layers 131c″ and 132c″ and the additional plating layers 131d″ and 132d″ are formed beyond the extension line E2 of the second surface 2 and the extension line E1 of the first surface 1, the external electrodes 131″ and 132″ may be formed beyond the extension line E2 of the second surface 2 and the extension line E1 of the first surface 1.

In this case, one end of the first base electrode layer 131a″ may be disposed on a 2-3 corner (c2-3) connecting the second and third surfaces, and the other end of the first base electrode layer 131a″ may be disposed on a 1-3 corner (c1-3) connecting the first and third surfaces. One end of the second base electrode layer 132a″ may be disposed on a 2-4 corner (c2-4) connecting the second and fourth surfaces 2 and 4, and the other end of the second base electrode layer 132a″ may be disposed on a 1-4 corner (c1-4) connecting the first surface and fourth surfaces 1 and 4.

A size of the multilayer electronic component 100 does not need to be limited.

However, to achieve both miniaturization and high capacitance, since the number of laminated layers should be increased by thinning dielectric layers and internal electrodes, an effect of improving reliability and capacitance per unit volume may become more remarkable in the multilayer electronic component 300 having a size of 1005 (length×width, 1.0 mm×0.5 mm).

Accordingly, when the multilayer electronic component 100 has a length of 1.1 mm or less and a width of 0.55 mm or less in consideration of a manufacturing error, a size of an external electrode, and the like, a reliability improvement effect according to the present disclosure may be more remarkable. Here, the length of the multilayer electronic component 100 may refer to a maximum size of the multilayer electronic component 100 in the second direction, and the width of the multilayer electronic component 100 may refer to a maximum size of the multilayer electronic component 100 in the third direction.

EXAMPLE

An average thickness of base electrode layers 131a and 132a and an average thickness of thin film electrode layers 131b and 132b were adjusted, and whether or not a void occurred in the base electrode layers 131a and 132a, whether or not a void is covered by the thin film electrode layers 131b and 132b, and whether or not a tape test was defective in the thin film electrode layers 131b and 132b were evaluated and described in Table 1 below.

The base electrode layers 131a and 132a were formed by printing a pad containing Ni and glass, in test Nos. 1 to 3, a thin film electrode layer was not formed, in test Nos. 4, 5, 7 to 10, a thin film electrode layer was formed by depositing Cu by a sputtering method, and in test No. 6, a thin film electrode layer was formed by depositing Ni—Cr by a sputtering method.