220 along the rim. The anti-fall bump 221 may prevent the surrounding foreign matter particles (P) falling on the upper surface of the cover 220 or the ink (I) of the nozzle (21 in FIG. 5) from escaping to the outside of the cover 220 and falling.

In detail, the surrounding foreign matter particles P falling on the upper surface of the cover 220 may move on the upper surface of the cover 220 by external force such as movement of the cover 220, and the cover 220 blocks the foreign matter particles P from moving to the outside of the cover 220. In addition, the ink I dropped on the upper surface of the cover 220 may flow from the upper surface of the cover 220 by the external force such as movement of the cover 220, and in this case, the cover 220 blocks the ink (I) from flowing to the outside of the cover 220.

Also, a plurality of grooves 222 may be formed in an upper surface of the cover 220. As the ink (I) falling on the upper surface of the cover 220 is absorbed into the plurality of grooves 222, the ink I may be reliably prevented from escaping from the upper surface of the cover 220.

In detail, the plurality of grooves 222 may form an arrangement structure in which the plurality of grooves 222 intersect in an inclined form in the upper surface of the cover 220, as an example, as illustrated in the drawing. Furthermore, although not illustrated in the drawings, the plurality of grooves 222 may form a vertically crossed arrangement structure. Accordingly, even when the ink (I) flows in any direction on the upper surface of the cover 220, the ink (I) touches the plurality of grooves 222 crossed, and therefore, the ink may be absorbed into the plurality of grooves 222.

FIG. 7 is a view illustrating a suction member as a cleaning unit in an apparatus for preventing blockage of a floating stage of a substrate processing apparatus according to a third embodiment.

Referring to the drawings, in an embodiment of the present disclosure, a cleaning unit 230 may further be included. The cleaning unit 230 is disposed above the cover 220 and serves to clean the cover 220. The cleaning of the cover 220 by the cleaning unit 230 may be periodically performed at appropriate intervals.

In detail, the cleaning unit 230 may include the suction member 231.

The suction member 231 sucks foreign particles (P in FIG. 6) or ink (I in FIG. 6) on the upper surface of the cover 220. The suction member 231 may remove foreign matter particles or ink from the upper surface of the cover 220 by suctioning foreign matter particles or ink from the upper surface of the cover 220 with strong suction force. Of course, the specific configuration of the suction member 231 is not limited by the present disclosure, and any suction configuration of the related art may be used.

FIG. 8 is a view illustrating a cleaning member and a drying member as a cleaning unit in the apparatus for preventing blockage of a floating stage of a substrate processing apparatus according to a fourth embodiment of the present disclosure.

Referring to the drawing, the cleaning unit 230 may include a cleaning member 232 and a drying member 234.

The cleaning member 232 sprays a cleaning liquid on the upper surface of the cover 220. As the cleaning solution, pure water or the like may be used. Foreign matter particles falling on the upper surface of the cover 220 adhere to the upper surface of the cover 220 over time. Adhered foreign matter particles are not easily removed from the upper surface of the cover 220, but may be easily removed by spraying a cleaning solution by the cleaning member 232. In addition, the ink dropped on the upper surface of the cover 220 dries quickly and becomes hard. The hardened ink may be easily removed by being dissolved by spraying a cleaning liquid onto the upper surface of the cover 220 by the cleaning member 232. Of course, the detailed configuration of the cleaning member 232 is not limited by the present disclosure, and any cleaning configuration of the related art may be utilized. On the other hand, cleaning liquid contaminated by foreign particles or ink may be removed. As an example, a drain (not illustrated) is formed in one side of the cover 220 so that the cleaning liquid on the upper surface of the cover 220 may be drained to one side. In this case, a receiving member (not illustrated) for receiving the drained cleaning solution may be disposed in one lower side of the cover 220.

The drying member 234 is disposed parallel to the cleaning member 232 and dries the cover 220 wet with the cleaning solution. To rapidly switch from the cleaning operation to the application operation, the drying member 234 may dry the wet cover 220 with the cleaning liquid. As the drying member 234, any drying method of the related art, such as a drying method using multiple heat or a drying method using hot air may be used as a drying method. Of course, the detailed configuration of this drying member 234 is not limited by the present disclosure, and any drying configuration of the related art may be used.

FIG. 9 is a view illustrating a cleaning member, an ultrasonic wave generating member, and a drying member as a cleaning unit in an apparatus for preventing blockage of a floating stage of a substrate processing apparatus according to a fifth embodiment.

Referring to the drawing, the cleaning unit 230 may include a cleaning member 232, an ultrasonic wave generating member 233 and a drying member 234. In this case, a detailed description of the cleaning member 232 and the drying member 234 has already been described above based on FIG. 8, and thus, the description thereof will be omitted.

The ultrasonic wave generating member 233 is disposed parallel to the cleaning member 232 and ultrasonically vibrates the cleaning solution. For example, the ultrasonic wave generating member 233 generates ultrasonic waves in the cleaning fluid sprayed from the cleaning member 232 to vibrate the cleaning fluid with ultrasonic waves. As the cleaning liquid is vibrated by ultrasonic waves in this manner, the removal rate of foreign matter particles or ink on the upper surface of the cover 220 may be increased. For example, the cleaning effect may be increased due to the cleaning liquid vibrated by ultrasonic waves. Of course, the detailed configuration of the ultrasonic wave generating member 233 is not limited by the present disclosure, and any ultrasonic wave generating configuration of the related art may be used.

FIG. 10 is a view illustrating a suction member, a cleaning member, an ultrasonic wave generating member, and a drying member as cleaning units in an apparatus for preventing blockage of a floating stage of a substrate processing apparatus according to a sixth embodiment.

Referring to the drawings, the cleaning unit 230 may include a suction member 231, a cleaning member