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Nov 15, 2011

Hitachi Chemical: CMP Slurry Patent Infringement Lawsuit Against Korean Company - MarketWatch

Hitachi Chemical Co., Ltd. (tokyo:4217)(head office:Tokyo)(ceo and president:Kazuyuki Tanaka)(capital:15.5 billion yen)(capital:hereinafter referred to as "Hitachi Chemical") announced today that it has filed a lawsuit in the United States District Court for the Western District of Texas against K. C. Tech Co., Ltd (head office:Seoul)(head office:South Korea)(head office:hereinafter referred to as "K. C. Tech") asserting that K. C. Tech infringes Hitachi Chemical's patents relating to cerium oxide slurry for chemical mechanical planarization processes for polishing semiconductor wafers.